PVD SPUTTERING SYSTEM

The AIT PVD Sputter Systems are custom-designed for R&D Laboratory, Pilot Production and full Production applications.Key performance features include the uniform deposition of a wide variety of materials on various different substrates. Additional features include versatility, ease of operation, and long-term reliability for single and multi-layered films.

  • UHV and XHV vacuum deposition chambers configured with various different high-vacuum pumps including turbopumps, cryopumps, diffusion and ion pump.

  • Option for load-lock chambers with linear motion magnetic transfer arm with susceptor and wafer up/down lifter for accepting/releasing wafer onto substrate holder.

  • Sputter cathode sources configured for sputter up/down, vertical or confocal arrangement, with flexible adjustable angle joints and telescoping (source to substrate distance) and co-sputtering from multiple sources.

  • Sputter cathode sources available for use with RF/DC/Pulse DC power supplies, deposition of metals, dielectrics, semiconductor, magnetic and paramagnetic materials ranging in size from 2” to 8” diameter for use with clamped/bonded sputter targets.

  • Choice in selection of power supplies in a range of power ratings including RF (with auto RF matching network), DC, and Pulsed DC.

  • Real-time Adaptive Pressure Control (APC) for control of sputter gas pressure allowing for constant and uniform deposition rates.

  • Option for sputter-etch/clean with pneumatically-activated rotatable gas injection shower head.

  • Option for Ion Assisted Deposition (IAD).

  • Option for substrate heating to maximum 1000°C.

  • Class 100 cleanroom compatible.

  • Typical coating non-uniformity of <+/-3% WIW, WTF, and RTR.

  • PLC and Industrial PC System Control/Operation for manual, semi-auto and fully-auto with auto process sequence generation/editing, recipe builder, multi-steps and looping coating procedures and storage of recipes.

  • Available as a mini sputter deposition system for R&D applications.

 

Tel: (852) 2719-5440

Fax: (852) 2358-4766

1901 Sunley Center, 9 Wing Yin Street, Tsuen Wan, Hong Kong

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