Specializing in semiconductor equipment for R&D, pilot production

and manufacturing applications!

AIT is semiconductor equipment, process and technology development company founded in Hong Kong in 1995.  It specializes in the design and fabrication of a wide variety of vacuum deposition and etching systems including Sputter, E-beam, Thermal, Pulsed Laser Deposition (PLD), Ion Beam Deposition (IBD), Ion Beam Etch (IBE), Plasma Enhanced Chemical Vapour Deposition (PECVD), Inductively Coupled Plasma Reactive Ion Etch (ICP/RIE), Deep Reactive Ion Etch (DRIE) and various other Plasma Systems for R&D Laboratory, Pilot Production and Manufacturing applications.


 AIT also custom designs and fabricates Wet Process Stations for a variety of acid (polypropylene) based and solvent (stainless steel) based benches for manual, semi-auto and fully-automated operation.  The Company's extensive experience and knowledge in wet chemical processing of semiconductor devices and materials compatibility is included in the design and fabrication of wet process stations for efficiency, versatility, safety and long-term reliability of the product.


Key advantages of using AIT's equipment includes the experience and expertise in thin film vacuum deposition and etching process and techniques - all if which are incorporated into the design and function of our equipment.


PVD Sputtering System

Tel: (852) 2719-5440

Fax: (852) 2358-4766

1901 Sunley Center, 9 Wing Yin Street, Tsuen Wan, Hong Kong

© 1995 AIT.  All rights reserved.